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Intel unveils 32nm process technology - Intel unveils 32nm process technology
Thu, February 12 2009 | 7:18PM | PermaLink Feedback?
The 32nm processors are based on the same materials used in Intel’s 45nm chips, using a high-k gate dielectric and a metal gate, as opposed to the old SiO2 dielectric and polysilicon gate used in Intel’s previous 65nm chips. However, Intel was keen to point out that it’s now refined the high-k + metal gate technology, which the company says is now in its second generation.
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